Vyhmeister-Bastidas, Eduardo A.

Profile Picture

Filters

20081
Reset filters

Settings

Citations

Publication Search Results

Now showing 1 - 1 of 1
  • Thumbnail Image
    Publication
    Surface modification of nanoporous films using organosilanes dissolved in supercritical carbon dioxide
    (2008) Vyhmeister-Bastidas, Eduardo A.; Estévez-De Vidts, L. Antonio; College of Engineering; Benítez Rodríguez, Jaime; Colón Burgos, Guillermo; Muscat, Anthony J.; Department of Chemical Engineering; Rivera Montalvo, Luis A.
    It is well known in the microprocessor industry that as the number of transistors increases, the capacity of chips to manage information also increases. To continue with the increment in the number of transistors per integrated circuit (IC), manufacturers have followed a continuous reduction in size of these units. This reduction in size comes linked to negative effects, such as resistance-capacitance-delay (RC-delay), cross talk, and power consumption increase. Integrated circuits manufacturers have changed to new materials that diminish these negative effects, but incompatibilities with the damascene process used for the fabrication of metallic interconnections, have slowed down the increasing trends of transistor density. A recognized alternative for the recovery of electrical properties of damaged silicon-based films is the use of organosilanes. Organosilanes dissolved in supercritical carbon dioxide have been considered an enhanced alternative for the recovery of these damaged films. In this work, a thorough study of the different factors that can affect the repaired properties of damaged methylsilsesquioxane films was performed. Fluid phase equilibria of chlorosilanes-carbon dioxide mixtures, electric and hydrophobic properties recovery by the use of different organolsilanes, control and analysis on thicknesses of deposited films by different silylation reaction mechanisms, determination of kinetic parameters for the rate-law expression of different organosilane silylating reactions, and a comprehensive infrared analyses of the different bonds formed in gas and solid phases by the silylating reaction were studied in this work. Experimental apparatuses were designed for these studies, which include a new real-time, infrared system capable of studying the solidgas interaction at high pressure conditions. This study led to a thorough understanding of the reaction mechanisms that takes place in the gas and solid phases. Consequently, the effect of controllable parameters such as pressure, temperature, and concentration of organosilanes is now better understood and specific results in the repairing process can now be obtained.