Pérez-Almodóvar, Delvis

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Aluminum tolerance, growth, and organic acid exudation in rambutan (Nephelium Lappaceum)
(2012) Pérez-Almodóvar, Delvis; Mina, Nairmen; College of Arts and Sciences - Sciences; Vega, Carmen; Goenaga, Ricardo; Department of Chemistry; Joyce, James
A randomized complete block design experiment with six aluminum (Al) concentrations was carried out to evaluate the effect of aluminum on nutrient content, dry matter (DM) production and Al-induced organic acid exudation in rambutan (Nephelium lappaceum). Rambutan cultivar cv. Jitlee was grown in nutrient solution at pH 4.0 with 1.0, 2.3, 4.1, 6.7 and 10.2 mM Al and without Al. The results revealed that all growth variables were significantly reduced with increasing concentration of Al in the nutrient solution. Nevertheless, even at an aluminum concentration of 3.5 mM, rambutan plants grew relatively well, confirming that this crop is highly tolerant to high Al as compared to other crops. Analyses of root exudates for the presence of organic acids showed no detectable amounts in solution. Accumulation of Al in leaves, stems and roots suggests the existence of an Al- sequestration mechanism in rambutan which may involve an Al-ligand complex which translocates from roots to shoots, where it may accumulate in leaf vacuoles.